Business License
Contact Us
Your inquiry content must be between 10 to 5000 characters
Please enter Your valid email address
Source Direct: High-Purity Ti-Al Targets for Advanced Vacuum Coating
The stability of the global vacuum deposition supply chain relies heavily on premium sputtering consumables. Backed by over 100 patented technologies and a 35,000-square-meter standardized production facility, UV Tech Material LTD. has established large-scale mass manufacturing capabilities for both thermal spraying and cold spraying processes.
Our flagship consumable is the Titanium Aluminum Target | ≥99.5% purity, supplied in a high-performance rotary target configuration. Engineered for the flat panel display industry, the decorative and functional coating industry, and the superconductivity and quantum electronics sectors, this material ensures superior bonding strength, structural density, and stable deposition rates during continuous vacuum coating.
To accommodate various global magnetron sputtering systems, UV Tech Material LTD. offers fully customizable dimensions tailored to your specific cathode requirements. Our modern production setup thoroughly supports sample testing and bulk purchasing, ensuring reliable delivery and long-term production stability.
Recently Posted
-
High-Purity Silicon Aluminum Targets for Energy Storage and Smart Glass Manufacturing
August 28, 2026The stability of the global supply chain in vacuum deposition relies heavily on premium sputtering consumables. Accumulating over
Read More -
Mass Production Ready: ≥99.9% Purity Ti-Si Rotary Targets for Semiconductor Deposition
August 27, 2026The stability of the global vacuum deposition supply chain relies heavily on premium sputtering consumables. The accumulation of o
Read More -
UV Tech Material LTD. High-Purity Indium Tin Target for Semiconductor & Display Deposition
August 25, 2026Guangzhou UV Tech Material LTD., as a dedicated manufacturer, provides advanced deposition solutions tailored for rigorous applica
Read More -
Zn‑Al Sputtering Target: Specifications, Process & Industrial Applications
August 24, 2026Zn‑Al sputtering target is an important alloy sputtering source for magnetron sputtering thin‑film deposition. UVTM (UV Tech Mater
Read More
Contact Us
Recommended Products
-
Rotatable NbOx Sputtering TargetUS$ 1000 - 20000MOQ: 2 Pieces -
ITO Target 90:10 95:5 99.99 4N High Purity Planar Sputtering Target With Backing Plate Manufacturer Factory PriceNegotiableMOQ: 1 Set
-
ITO Target 90:10 95:5 99.99 4N High Purity Rotary Bonding ITO Sputtering Target With Backing Tube Manufacturer Factory PriceNegotiableMOQ: 1 Piece
-
Arc Ti Target TiAl Cu Al Si Planar Sputtering Target for PVD Coating Thin FilmNegotiableMOQ: 10 Pieces
-
NiCr Target UVTM Alloy Target for Magnetron Sputter Coating Low e Glass Nano Thin FilmNegotiableMOQ: 2 Pieces
-
TiAl Target UVTM Alloy Target for Vacuum Sputter Coating TiAl Alloy Thin Film Made in ChinaNegotiableMOQ: 2 Pieces
-
Cr Target High Purity Planar Chromium UVTM Target Bonding Copper Backing Plate Factory PriceNegotiableMOQ: 2 Sets
-
AZO Target 98:2 99:1 4N High Purity Rotary Bonding AZO Sputtering Target With Backing Tube Manufacturer Factory PriceNegotiableMOQ: 1 Piece
-
NbOx Target Niobium Oxide Rotary Sputtering Target for Magnetron Sputter Low e Glass and Reflective Glass Coating Nano Thin FilmNegotiableMOQ: 2 Pieces
-
SiAl Target UVTM Alloy Target for Magnetron Sputter Coating SiO2 SiN4 Nano Thin FilmNegotiableMOQ: 2 Pieces
