- UV TECH MATERIAL LTD.
- Main products: sputtering target, Niobium sputtering target, NbOx target, ITO target, AZO target
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- Rotatable Ag Target
- Planar Ag target
- Planar Mo target
- Planar Cr Target
- Rotatable Nb Target
- Rotatable SiAl Target
- Plane Al Alloy Target
- Rotatable NbOx Target
- Rotatable ITO Target
- Rotatable AZO Target
- Rotatable NbOx Sputtering Target
- ITO target 90:10 95:5 99.99 4N high purity planar sputtering target with backing plate manufacturer factory price
- ITO target 90:10 95:5 99.99 4N high purity rotary bonding ITO sputtering target with backing tube manufacturer factory price
- Arc Ti target TiAl Cu Al Si planar sputtering target for PVD coating thin film
- NiCr target UVTM alloy target for magnetron sputter coating low e glass nano thin film
- TiAl target UVTM alloy target for vacuum sputter coating TiAl alloy thin film made in China
- Cr target high purity planar chromium UVTM target bonding copper backing plate factory price
- AZO target 98:2 99:1 4N high purity rotary bonding AZO sputtering target with backing tube manufacturer factory price
- NbOx target Niobium Oxide rotary sputtering target for magnetron sputter low e glass and reflective glass coating nano thin film
- SiAl target UVTM alloy target for magnetron sputter coating SiO2 SiN4 nano thin film
- Silver(Ag) target pure silver vacuumm thin film sputtering coating material sputter target
- Silver(Ag) target pure silver vacuumm thin film sputtering coating material sputter target
- Al target pure Aluminium metal tube target for mirror and silver color coating
- CuZn target UVTM Copper Zinc rotary sputtering target factory high purity with competitive price
- Zr target pure metal target for vacuum sputter coating
- TiAl target UVTM alloy target for vacuum sputter coating TiAl alloy thin film
- SiAl target UVTM alloy target for magnetron sputter coating SiO2 SiN4 nano thin film
- NbOx target Niobium Oxide rotary sputtering target for magnetron sputter low e glass and reflective glass coating nano thin film
- AZO target 98:2 99:1 4N high purity rotary bonding AZO sputtering target with backing tube manufacturer factory price
- NiCr target UVTM alloy target for magnetron sputter coating low e glass nano thin film
- Cr target high purity planar chromium UVTM target bonding copper backing plate factory price
- TiOx target Titanium Oxide rotary sputtering target for magnetron sputter low e glass and reflective glass coating nano thin film
- Indium target In rotary sputtering target for magnetron sputter coating nano thin film on glass
- Copper target Cu rotary sputtering target for magnetron sputter coating nano thin film
- Arc Ti target TiAl Cu Al Si planar sputtering target for PVD coating thin film
- ITO target 90:10 95:5 99.99 4N high purity rotary bonding ITO sputtering target with backing tube manufacturer factory price
- Planar ITO target, Magnetron Sputtering Target, In2O3:SnO2 target, 90:10 ITO, 95:5 ITO, 97:3 ITO
- Rotatable ITO target, Magnetron Sputtering Target, In2O3:SnO2 target, 90:10 ITO, 95:5 ITO, 97:3 ITO
- Planar Ag target, Silver Sputtering target, Monolithic silver target
- Planar NiCr target, Nickel Chromium Sputtering target
- Planar TiAl target, Aluminium Sputtering target
- Planar Al target, Aluminium Sputtering target
- Planar Ti target, Titanium Sputtering target
- Planar Cr target, Chromium Sputtering target
- Planar Si target for PVD thin film coating, P-Type Silicon planar sputtering target
- Rotatable Zr sputtering target, Extruded without mis-connect, Magnetron Sputtering Target, Zirconium sputtering target
- Rotatable Ag target made by Cold plasma spray, Magnetron Sputtering Target, Silver sputtering target
- Rotatable AZO target, Magnetron Sputtering Target, ZnO.Al2O3 target, Zinc Aluminium Oxide target
- Rotatable Cr target (Vacuum coating equipment & machines), Magnetron Sputtering Target, Chromium target
- Rotatable SiAl 90:10, 92:8, 94:6, 95:5, 98:2 Alloy target, mainly application for Low-E Glass coating, Magnetron Sputtering Target, silicon ALuminium target
- Rotary TiOx target, mainly application for Low-E Glass coating, Magnetron Sputtering Target,Titanium Oxide target
- Rotatable Si target, vacuum plasma spray, Magnetron Sputtering Target, Silicon target
- Rotatable Nb target, high quality made by cold plasma spray, Magnetron Sputtering Target, Niobium target
- Al sputtering target, high quality made by cold plasma spray, Magnetron Sputtering Target, Aluminium target
- Rotatable Nb2Ox target with thickess to 10mm, Magnetron Sputtering Target, Niobium Oxide target
- Rotatable ZrOx target, New product made by plasma spray, Magnetron Sputtering Target, Zirconium Oxide target
- Rotatable NiCr target, more effeciency than planar, Magnetron Sputtering Target, Nickel Chromium target
- Cu sputtering target, Copper target, high purity imported material, Magnetron Sputtering Target
- Rotatable ZnSn Alloy target, Magnetron Sputtering Target
- Rotatable ZnAl Alloy target, Magnetron Sputtering Target
